https://doi.org/10.1140/e10051-002-0002-1
Metal nanocluster formation in silica films prepared by rf-sputtering: an experimental study
1
INFM, Dipartimento di Fisica, Università di Padova, via Marzolo 8, 35131 Padova, Italy
2
INFM, European Synchrotron Radiation Facility, GILDA-CRG, BP 220, 38043
Grenoble, France
3
INFM, Dipartimento di Chimica Fisica, Università di Venezia, Dorsoduro 2137, 30123
Venezia, Italy
4
INFM, Dipartimento di Fisica, Universitá di Trento, 38050 Povo-Trento, Italy
5
CNR-CeFSA, Centro Fisica Stati Aggregati, 38050 Povo-Trento, Italy
Corresponding author: a gonella@unive.it
Received:
29
June
2001
Published online: 15 January 2002
Composite silica films containing metal nanoclusters were prepared by the rf- sputtering technique, in which SiO2 was co-deposited with gold+copper, gold+silver, or copper+silver. The formation of either pure or alloy clusters was studied by extended X-ray absorption fine structure spectroscopy and transmission electron microscopy. For all systems, the presence of alloy aggregates was evidenced. Moreover, small amounts of pure metal aggregates as well as dispersed or oxidized dopants were observed.
PACS: 61.46.+w – Nanoscale materials: clusters, nanoparticles, nanotubes, and nanocrystals / 61.10.Ht – X-ray absorption spectroscopy: EXAFS, NEXAFS, XANES, etc. / 81.05.Pj – Glass-based , vitroceramics
© EDP Sciences, Società Italiana di Fisica, Springer-Verlag, 2002
