Eur. Phys. J. B 36, 401-410 (2003)
https://doi.org/10.1140/epjb/e2003-00359-0

Interplay between phase ordering and roughening on growing films

¹ Institut für Festkörperphysik, TU Darmstadt, Hochschulstr. 6, 64289 Darmstadt, Germany
² Department of Physics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139

Corresponding author: ^a This email address is being protected from spambots. You need JavaScript enabled to view it.

Received: 23 July 2003
Published online: 23 December 2003

Abstract

We study the interplay between surface roughening and phase separation during the growth of binary films. Renormalization group calculations are performed on a pair of equations coupling the interface height and order parameter fluctuations. We find a larger roughness exponent at the critical point of the order parameter compared to the disordered phase, and an increase in the upper critical dimension for the surface roughening transition from two to four. Numerical simulations performed on a solid-on-solid model with two types of deposited particles corroborate some of these findings. However, for a range of parameters not accessible to perturbative analysis, we find non-universal behavior with a continuously varying dynamic exponent.