https://doi.org/10.1140/epjb/e2004-00012-6
Island growth in submonolayer deposition with aggregation and fragmentation
1
Laboratory of Physics, PO Box 1100, 02015 HUT, Espoo,
Finland
2
Department of Physical Sciences, University of Helsinki,
PO Box 64, 00014 University of Helsinki, Finland
Corresponding author: a Marko.Rusanen@ifp.fr
Received:
28
May
2003
Revised:
4
September
2003
Published online:
30
January
2004
Island growth is studied in the case of island aggregation and break-up during submonolayer deposition. It is demonstrated that the island size distributions are of the scaling form and the mean island size has a power-law behaviour corresponding to hyperthermal deposition conditions. The corresponding scaling exponents are analytically derived and compared with the simulations by the revised particle coalescence method developed here. The scaling exponents are found to depend only on the homogeneity exponents of aggregation and fragmentation kernels.
PACS: 68.55.-a – Thin film structure and morphology / 68.35.Fx – Diffusion; interface formation / 36.40.Sx – Diffusion and dynamics of clusters
© EDP Sciences, Società Italiana di Fisica, Springer-Verlag, 2003