https://doi.org/10.1140/epjb/e2004-00372-9
Magnetic texturing of xenon-ion irradiated nickel films
1
II. Physikalisches Institut and Sonderforschungsbereich 602,
Universität Göttingen, Friedrich-Hund-Platz 1, 37077
Göttingen, Germany
2
IV. Physikalisches Institut, Universität Göttingen,
Friedrich-Hund-Platz 1, 37077 Göttingen, Germany
Corresponding author: a plieb@gwdg.de
Received:
29
July
2004
Revised:
30
September
2004
Published online:
14
December
2004
Thin polycrystalline Ni films of typically 75 nm thickness evaporated on Si
or SiO2 substrates were irradiated with 30–900 keV Xe-ions to
fluences of 
/cm2. The magnetization of the
Ni films was measured using the longitudinal Magneto-Optical Kerr Effect and
Vibrating Sample Magnetometry. The Ni-film thickness and Xe-concentration
profiles were determined with Rutherford backscattering spectroscopy and the
lattice dilation with X-ray diffraction. The Xe-irradiations were found to
induce an in-plane uniaxial magnetic anisotropy within the Ni-films. This
magnetic texture was investigated in relationship to the microstructure as
function of the ion energy and fluence, the sample temperature, the
presence of an external magnetic field during the irradiation and the stress
field produced before, during and after the implantations.
PACS: 61.82.Bg – Metals and alloys / 68.55.Ln – Defects and impurities: doping, implantation, distribution, concentration, etc. / 75.30.Gw – Magnetic anisotropy / 75.70.-i – Magnetic properties of thin films, surfaces, and interfaces
© EDP Sciences, Società Italiana di Fisica, Springer-Verlag, 2004
