Regular Article - Statistical and Nonlinear Physics
Diffusion in the presence of a chiral topological defect
Laboratoire de Physique et Chimie Théoriques, Université de Lorraine, 54506, Vandoeuvre-les-Nancy Cedex, France
2 L4 Collaboration and Doctoral College for the Statistical Physics of Complex Systems, Leipzig-Lorraine-Lviv-Coventry, Lorraine, France
Accepted: 15 July 2022
Published online: 28 July 2022
We study the diffusion processes of a real scalar field in the presence of the distortion field induced by a chiral topological defect. The defect modifies the usual Euclidean background geometry into a non-diagonal Riemann–Cartan geometry characterized by a singular torsion field. The new form of the diffusion equation is established and the scalar field distribution in the vicinity of the defect is investigated numerically. Results show a high sensitivity to the boundary conditions. In the transient regime, we find that the defect vorticity generates an angular momentum associated with the diffusion flow and we discuss its main properties.
© The Author(s), under exclusive licence to EDP Sciences, SIF and Springer-Verlag GmbH Germany, part of Springer Nature 2022